TY  - JOUR
AU  - Mascaraque Susunaga, Arantzazu
AU  - Avila, J.
AU  - Teodorescu, C.
AU  - Asensio, M. C.
AU  - Michel, E. G.
PY  - 1997
DO  - 10.1103/PhysRevB.55.R7315
SN  - 0163-1829
UR  - https://hdl.handle.net/20.500.14352/59425
T2  - Physical review B
AB  - The early stages of Fe/Si(111) interface formation have been investigated using x-ray photoelectron diffraction. Deposition of Fe in the range of one monolayer on Si(111)7x7 at room temperature results in the destruction of the 7x7 reconstruction....
LA  - eng
M2  - R7315
PB  - American Physical Society
KW  - Photoelectron diffraction
KW  - Electron-Diffraction
KW  - Si(111)
KW  - Growth
KW  - Silicides
KW  - Surface
KW  - Superlattices
KW  - Microscopy
KW  - Cobalt
KW  - Films
TI  - Atomic structure of the reactive Fe/Si(111)7x7 interface
TY  - journal article
VL  - 55
ER  -