TY  - JOUR
AU  - Martil De La Plaza, Ignacio
AU  - González Díaz, Germán
AU  - Prado Millán, Álvaro Del
AU  - San Andrés Serrano, Enrique
PY  - 2003
DO  - 10.1063/1.1566476
SN  - 0021-8979
UR  - https://hdl.handle.net/20.500.14352/51134
T2  - Journal of Applied Physics
AB  - SiOxNyHz films were deposited from O-2, N-2, and SiH4 gas mixtures at room temperature using the electron cyclotron resonance plasma method. The absolute concentrations of all the species present in the films (Si, O, N, and H) were measured with high...
LA  - eng
M2  - 8930
PB  - American Institute of Physics
KW  - Silicon-Oxynitride Films
KW  - Chemical-Vapor-Deposition
KW  - Paramagnetic Point-Defects
KW  - Nitride Thin-Films
KW  - A-SiNx-H
KW  - Substrate-Temperature
KW  - Tetrahedron Model
KW  - Plasma
KW  - Nitrogen
KW  - Growth.
TI  - Optical and structural properties of SiOxNyHz films deposited by electron cyclotron resonance and their correlation with composition
TY  - journal article
VL  - 93
ER  -