TY  - JOUR
AU  - Martil De La Plaza, Ignacio
AU  - González Díaz, Germán
AU  - Prado Millán, Álvaro Del
AU  - San Andrés Serrano, Enrique
PY  - 2004
DO  - 10.1063/1.1699525
SN  - 0021-8979
UR  - https://hdl.handle.net/20.500.14352/51120
T2  - Journal of Applied Physics
AB  - The influence of H on the composition and atomic concentrations of Si, O, and N of plasma deposited SiOxNyHz films was investigated. The bonding scheme of H was analyzed by Fourier-transform infrared spectroscopy. The composition and absolute...
LA  - eng
M2  - 5373
PB  - American Institute of Physics
KW  - Silicon-Oxynitride Films
KW  - Chemical-Vapor-Deposition
KW  - Electron-Cyclotron-Resonance
KW  - Tetrahedron Model
KW  - Thin-Films
KW  - vibrations
KW  - Oxide
KW  - CVD.
TI  - Influence of H on the composition and atomic concentrations of "N-rich" plasma deposited SiOxNyHz films
TY  - journal article
VL  - 95
ER  -