TY  - JOUR
AU  - Martil De La Plaza, Ignacio
AU  - González Díaz, Germán
AU  - Prado Millán, Álvaro Del
AU  - San Andrés Serrano, Enrique
PY  - 2003
DO  - 10.1023/A:1023952718281
SN  - 0957-4522
UR  - https://hdl.handle.net/20.500.14352/51140
T2  - Journal of Materials Science: Materials in Electronics
AB  - In this work we present a new method to fabricate improved TiO2 films by using a high-pressure sputtering system. In order to minimize the damage induced in the substrate surface by the ion bombardment, a high chamber pressure of 100 Pa is used, which...
LA  - eng
M2  - 375
PB  - Kluwer Academic Publ.
KW  - Thin-Films
KW  - Fabrication.
TI  - A comparative study of anodic tantalum pentoxide and high-pressure sputtered titanium oxide
TY  - journal article
VL  - 14
ER  -