TY  - JOUR
AU  - Martil De La Plaza, Ignacio
AU  - González Díaz, Germán
AU  - Prado Millán, Álvaro Del
PY  - 1999
DO  - 10.1116/1.582039
SN  - 0734-2101
UR  - https://hdl.handle.net/20.500.14352/59268
T2  - Journal of vacuum science & technology a: Vacuum surfaces and films
AB  - The effect of deposition temperature on the physical properties of SiOxNy films has been studied. The films have ben deposited from mixtures of SiH4, O-2 and N-2, using the electron cyclotron resonance-chemical vapor deposition technique, with...
M2  - 1263
PB  - AVS Amer. Inst. Physics
KW  - Chemical-Vapor-Deposition
KW  - Silicon-Oxynitride Films
KW  - Refractive-Index
KW  - Plasma Method
KW  - Thin-Films
KW  - Nitride
KW  - Oxide.
TI  - Effect of substrate temperature in SiOxNy films deposited by electron cyclotron resonance
TY  - journal article
VL  - 17
ER  -