TY  - JOUR
AU  - Feijoo, P.C.
AU  - Pampillón Arce, María Ángela
AU  - San Andrés Serrano, Enrique
AU  - Fierro, J.L.G.
PY  - 2015
DO  - 10.1016/j.tsf.2015.07.045
SN  - 0040-6090
UR  - https://hdl.handle.net/20.500.14352/24316
T2  - Thin Solid Films
AB  - In this work we use the high pressure sputtering technique to deposit the high permittivity dielectric gadolinium scandate on silicon substrates. This nonconventional deposition technique prevents substrate damage and allows for growth of ternary...
LA  - eng
M2  - 62
PB  - Elsevier Science SA
KW  - Particle fluxes
KW  - Gate oxides
KW  - Thin-films
KW  - Thermalization
KW  - Dielectrics
KW  - Integration
KW  - Transistors
KW  - Technology
KW  - Plasma
KW  - Si.
TI  - Nano-laminate vs. direct deposition of high permittivity gadolinium scandate on silicon by high pressure sputtering
TY  - journal article
VL  - 593
ER  -