TY  - JOUR
AU  - Martil De La Plaza, Ignacio
AU  - González Díaz, Germán
AU  - Prado Millán, Álvaro Del
AU  - San Andrés Serrano, Enrique
PY  - 2002
DO  - 10.1016/S0042-207X(02)00220-8
SN  - 0042-207X
UR  - https://hdl.handle.net/20.500.14352/59098
T2  - Vacuum
AB  - Silicon oxynitride films covering the whole composition range from silicon nitride to silicon oxide have been deposited by electron cyclotron resonance chemical vapor deposition from SiH4, O-2 and N-2 gas mixtures. The composition of the films has...
LA  - eng
M2  - 507
PB  - Pergamon-Elsevier Science Ltd.
KW  - SiN(x-h) Films
KW  - SiOxNy Films
KW  - Temperature.
TI  - Composition and optical properties of silicon oxynitride films deposited by electron cyclotron resonance
TY  - journal article
VL  - 67
ER  -