TY  - JOUR
AU  - Martil De La Plaza, Ignacio
PY  - 2007
DO  - 10.1088/0022-3727/40/17/037
SN  - 0022-3727
UR  - https://hdl.handle.net/20.500.14352/51105
T2  - Journal of Physics D-Applied Physics
AB  - Thin films of hafnium oxide ( HfO2) have been grown by high pressure reactive sputtering on transparent quartz substrates ( UV- grade silica) and silicon wafers. Deposition conditions were adjusted to obtain polycrystalline as well as amorphous films....
LA  - eng
M2  - 5256
PB  - IOP Publishing LTD
KW  - Electron-Cyclotron-Resonance
KW  - Chemical-Vapor-Deposition
KW  - Hafnium Oxide
KW  - Spectroscopic Ellipsometry
KW  - Compositional Analysis
KW  - Amorphous-Silicon
KW  - Gate Dielectrics
KW  - Sioxnyhz Flms
KW  - Sin(X)-H Films
KW  - Plasma Method.
TI  - Optical properties and structure of HfO2 thin films grown by high pressure reactive sputtering
TY  - journal article
VL  - 40
ER  -