%0 Journal Article
%A Mártil de la Plaza, Ignacio
%A González Díaz, Germán
%A Prado Millán, Álvaro del
%A San Andrés Serrano, Enrique
%T Optical spectroscopic study of the SiN/HfO2 interfacial formation during rf sputtering of HfO2
%D 2007
%@ 0003-6951
%U https://hdl.handle.net/20.500.14352/51104
%X High-k stacks formed by chemical-vapor-deposited SiN and high-pressure sputtered HfO2 in either O-2 or Ar atmosphere have been studied. The introduction of a SiN layer is proposed to prevent the uncontrollable SiO2 growth while sputtering. The formation of Si-O bonds after the sputtering of the HfO2 film in O-2 atmosphere was observed by infrared spectroscopy. Optical diagnosis of the plasma demonstrated a high density of O radicals in the system when working with O-2. The small radius and high reactivity of these O radicals are the source of the SiN oxidation. However, the structure of the SiN film is preserved during Ar sputtering.
%~