TY  - JOUR
AU  - Martil De La Plaza, Ignacio
AU  - González Díaz, Germán
AU  - Prado Millán, Álvaro Del
AU  - San Andrés Serrano, Enrique
PY  - 2007
DO  - 10.1063/1.2811958
SN  - 0003-6951
UR  - https://hdl.handle.net/20.500.14352/51104
T2  - Applied physics Letters
AB  - High-k stacks formed by chemical-vapor-deposited SiN and high-pressure sputtered HfO2 in either O-2 or Ar atmosphere have been studied. The introduction of a SiN layer is proposed to prevent the uncontrollable SiO2 growth while sputtering. The...
LA  - eng
PB  - Amer Inst Physics
KW  - Thin-Films.
TI  - Optical spectroscopic study of the SiN/HfO2 interfacial formation during rf sputtering of HfO2
TY  - journal article
VL  - 91
ER  -