TY  - JOUR
AU  - Mártil de la Plaza, Ignacio
AU  - González Díaz, Germán
AU  - Prado Millán, Álvaro del
PY  - 1999
DO  - 10.1063/1.371008
SN  - 0021-8979
UR  - https://hdl.handle.net/20.500.14352/59258
T2  - Journal of Applied Physics
AB  - We analyze the effect of thermal processes on the optical properties (refractive index, optical gap, Tauc coefficient, and Urbach energy) of SiNx:H films. Films with three different nitrogen to silicon ratios (x = 0.97, x = 1.43, and x = 1.55,...
LA  - eng
M2  - 2055
PB  - American Institute of Physics
KW  - Chemical-Vapor-Deposition
KW  - Amorphous-Silicon Nitride
KW  - Thin-Films
KW  - Refractive-Index
KW  - Bonded-Hydrogen
KW  - Defects
KW  - Temperature
KW  - Dielectrics
KW  - Interfaces
KW  - Alloys.
TI  - Thermally induced changes in the optical properties of SiNx : H films deposited by the electron cyclotron resonance plasma method
TY  - journal article
VL  - 86
ER  -