RT Journal Article
T1 High Pressure Sputtering of materials for selective contacts in emerging photovoltaic cells
A1 San Andrés Serrano, Enrique
A1 García Hernansanz, Rodrigo
A1 Patricia Moreno, Gloria
A1 García Hemme, Eric
A1 Barrio, Rocío
A1 Torres Almarza, Ignacio
A1 Caudevilla Gutiérrez, Daniel
A1 Pastor Pastor, David
A1 Olea Ariza, Javier
A1 Prado Millán, Álvaro Del
A1 Algaidy, Sari
A1 Zenteno Pérez, Francisco
AB In this work we have explored the growth by high pressure sputtering (HPS) of materials intended for novel selective contacts for photovoltaic cells. This technique shows promise for the low-damage low-temperature deposition of PV materials. We studied the deposition of ITO, MoOx and TiOx using pure Ar and mixed Ar/O2 atmospheres as well as ceramic or metallic targets. We show that HPS deposition of these materials is feasible. The growth rate is greatly reduced when oxygen is added to the argon sputtering atmosphere. The best sputtering RF power was 20-45 W for the pressure range studied. Finally, as-deposited films present high surface recombination, but a mild hot plate anneal at 200ºC recovers long effective lifetimes.
PB IEEE
YR 2021
FD 2021
LK https://hdl.handle.net/20.500.14352/8501
UL https://hdl.handle.net/20.500.14352/8501
LA eng
NO ©IEEE.Spanish Conference on Electron Devices (CDE)(13.2021.Sevilla)The authors acknowledge the “CAI de Técnicas Físicas” of Universidad Complutense de Madrid for the support in sample fabrication. This work is part of the project MADRIDPV2 (P2018/EMT-4308) funded by the Comunidad Autónoma de Madrid with the support from FEDER Funds, project TEC2017-84378-R, funded by MICINN and European Social Fund, and project Project SCALED (PID2019- 109215RB-C42), funded by the Spanish of Ministry of Science and Innovation.. D. Caudevilla would also acknowledge grant PRE2018-083798, financed by MICINN and European Social Fund.
NO Comunidad de Madrid/FEDER
NO Ministerio de Ciencia e Innovación (MICINN)
DS Docta Complutense
RD 9 abr 2025