TY  - JOUR
AU  - Mártil de la Plaza, Ignacio
AU  - González Díaz, Germán
AU  - Prado Millán, Álvaro del
AU  - San Andrés Serrano, Enrique
PY  - 2005
DO  - 10.1016/j.tsf.2005.06.049
SN  - 0040-6090
UR  - https://hdl.handle.net/20.500.14352/51113
T2  - Thin Solid Films
AB  - The oxygen to silicon ratio of several SiOxHy thin films deposited by the electron cyclotron resonance plasma method was studied by several methods (heavy ion elastic recoil detection analysis, energy dispersive X-ray spectroscopy, Auger spectroscopy...
LA  - eng
M2  - 232
PB  - Elsevier Science SA
KW  - Photoluminescence
KW  - Nanocrystals.
TI  - Oxygen to silicon ratio determination of SiOXHY thin films
TY  - journal article
VL  - 492
ER  -