TY  - JOUR
AU  - Feijoo, Pedro Carlos
AU  - Pampillón, María Ángela
AU  - San Andrés Serrano, Enrique
AU  - Lucía Mulas, María Luisa
PY  - 2012
DO  - 10.1016/j.tsf.2012.11.008
SN  - 0040-6090
UR  - https://hdl.handle.net/20.500.14352/98235
T2  - Thin Solid Films
AB  - This work demonstrates the viability of scandium oxide deposition on silicon by means of high pressure sputtering. Deposition pressure and radio frequency power are varied for optimization of the properties of the thin films and the ScOx/Si interface....
LA  - eng
M2  - 81
PB  - Elsevier
KW  - High-k dielectrics
KW  - Scandium oxide
KW  - High pressure sputtering
TI  - Optimization of scandium oxide growth by high pressure sputtering on silicon
TY  - journal article
VL  - 526
ER  -