TY  - JOUR
AU  - Pérez Zenteno, Francisco José
AU  - García Hemme, Eric
AU  - Torres, I.
AU  - Barrio, R.
AU  - Duarte Cano, Sebastián
AU  - Benítez Fernández, Rafael
AU  - Caudevilla Gutiérrez, Daniel
AU  - García Hernansanz, Rodrigo
AU  - Olea Ariza, Javier
AU  - Pastor Pastor, David
AU  - Prado Millán, Álvaro Del
AU  - San Andrés Serrano, Enrique
PY  - 2024
DO  - https://doi.org/10.1016/j.mssp.2024.109038
SN  - 1369-8001
UR  - https://hdl.handle.net/20.500.14352/110511
T2  - Materials Science in Semiconductor Processing
AB  - In this article, we show the structural, optical, and electrical characterization of TiOx deposited by the unconventional technique of High-Pressure Sputtering (HPS). This technique has the potential to reduce the plasma-induced damage of the samples....
LA  - eng
M2  - 109038-1
PB  - Elsevier
KW  - High-pressure sputtering
KW  - Selective contacts
KW  - Photovoltaics
KW  - Plasma oxidation
KW  - Cox&Strack method
KW  - Heterojunction solar cells
TI  - High-pressure sputtering deposition and in situ plasma oxidation of TiOx thin films as electron selective contact for photovoltaic applications
T2  - High-pressure sputtering deposition and in situ plasma oxidation of TiOx thin films as electron selective contact for photovoltaic applications
TY  - journal article
VL  - 186
ER  -