TY  - JOUR
AU  - Martil De La Plaza, Ignacio
AU  - González Díaz, Germán
AU  - San Andrés Serrano, Enrique
PY  - 2005
DO  - 10.1016/j.microrel.2004.11.012
SN  - 0026-2714
UR  - https://hdl.handle.net/20.500.14352/51116
T2  - Microelectronics reliability
AB  - We investigate the influence of the used cleaning method and rapid thermal annealing (RTA) conditions on the electrical characteristics of MIS devices based on SiNy:H/SiOx dielectric stack structures fabricated by electron-cyclotron-resonance plasma...
LA  - eng
M2  - 978
PB  - Pergamon-Elsevier Science Ltd.
KW  - Films.
TI  - On the influence of substrate cleaning method and rapid thermal annealing conditions on the electrical characteristics of Al/SiNx/SiO2/Si fabricated by ECR-CVD
TY  - journal article
VL  - 45
ER  -