RT Journal Article
T1 A robust method to determine the contact resistance using the van der Pauw set up
A1 González Díaz, Germán
A1 Pastor, D.
A1 García Hemme, Eric
A1 Montero, Daniel
A1 García Hernansanz, Rodrigo
A1 Olea Ariza, Javier
A1 Prado Millán, Álvaro Del
A1 San Andrés Serrano, Enrique
A1 Martil De La Plaza, Ignacio
AB The van der Pauw method to calculate the sheet resistance and the mobility of a semiconductor is a pervasive technique both in the microelectronics industry and in the condensed matter science field. There are hundreds of papers dealing with the influence of the contact size, nonuniformities and other second order effects. In this paper we will develop a simple methodology to evaluate the error produced by finite size contacts, detect the presence of contact resistance, calculate it for each contact, and determine the linear or rectifying behavior of the contact. We will also calculate the errors produced by the use of voltmeters with finite input resistance in relation with the sample sheet resistance.
PB Elsevier Sci. Ltd
SN 0263-2241
YR 2017
FD 2017-02
LK https://hdl.handle.net/20.500.14352/17787
UL https://hdl.handle.net/20.500.14352/17787
LA eng
NO © 2017 Elsevier B.V. Authors would like to acknowledge the CAI de Técnicas Físicas of the Universidad Complutense de Madrid for the metallic evaporations and sample etching. This work was partially supported by the Project MADRID-PV (Grant No. P2013/MAE-2780) funded by the Comunidad de Madrid and by the Spanish MINECO (Economic and Competitiviness Ministery) under grant TEC 2013- 41730-R Research by E. García-Hemme was also supported by a PICATA predoctoral fellowship of the Moncloa Campus of International Excellence (UCM-UPM). D. Pastor acknowledges the financial support to the grant EX-2010-0662 from the Spanish Science Ministry.
NO Ministerio de Economía y Competitividad (MINECO)
NO Comunidad de Madrid
NO Campus de Excelencia Internacional (UCM-UPM)
DS Docta Complutense
RD 10 abr 2025