TY  - JOUR
AU  - Martil De La Plaza, Ignacio
AU  - González Díaz, Germán
AU  - Prado Millán, Álvaro Del
AU  - San Andrés Serrano, Enrique
PY  - 2008
DO  - 10.1016/j.vacuum.2008.03.083
SN  - 0042-207X
UR  - https://hdl.handle.net/20.500.14352/51099
T2  - Vacuum
AB  - Hafnium oxide films were deposited on silicon by High Pressure Reactive Sputtering (HPRS) at pressures between 0.8 and 1.6 mbar. Growth, composition and morphology were investigated using Transmission Electron Microscopy (TEM), Heavy Ion Elastic...
LA  - eng
M2  - 1391
PB  - Pergamon-Elsevier Science Ltd
KW  - Electron-Cyclotron-Resonance
KW  - Thin-Films
KW  - Optical-Properties
KW  - Sioxnyhz Films
KW  - HFO2
KW  - ERDA
KW  - Si.
TI  - Physical properties of high pressure reactively sputtered hafnium oxide
TY  - journal article
VL  - 82
ER  -