TY  - JOUR
AU  - Martil De La Plaza, Ignacio
AU  - González Díaz, Germán
PY  - 2000
DO  - 10.1016/S0026-2714(99)00322-4
SN  - 0026-2714
UR  - https://hdl.handle.net/20.500.14352/59236
T2  - Microelectronics reliability
AB  - Cleaning of InP surfaces using electron cyclotron resonance (ECR) nitrogen plasmas has been studied. Electrical performance of Al/SiNx:H/InP structures has been analysed to determine the effect of the plasma cleaning. The SINx:H insulator layers are...
LA  - eng
M2  - 837
PB  - Pergamon-Elsevier Science Ltd.
KW  - Electrical-Properties
KW  - Surface
KW  - Nitridation
KW  - Devices.
TI  - N-2 remote plasma cleaning of InP to improve SiNx : H/InP interface performance
TY  - journal article
VL  - 40
ER  -