TY  - JOUR
AU  - Martil De La Plaza, Ignacio
AU  - González Díaz, Germán
AU  - Lucía Mulas, María Luisa
AU  - San Andrés Serrano, Enrique
PY  - 2007
DO  - 10.1063/1.2769959
SN  - 0021-8979
UR  - https://hdl.handle.net/20.500.14352/51106
T2  - Journal of Applied Physics
AB  - Hafnium oxide films were deposited by high pressure reactive sputtering using different deposition pressures and times. The composition, morphology, and optical properties of the films, together with the sputtering process growth kinetics were...
LA  - eng
PB  - American Institute of Physics
KW  - Oxide Gate Dielectrics
KW  - Hafnium Oxide
KW  - Thin-Films
KW  - Binary Oxides
KW  - Silicon
KW  - Zorconium
KW  - ERDA.
TI  - High-pressure reactively sputtered HfO2: Composition, morphology, and optical properties
TY  - journal article
VL  - 102
ER  -