RT Journal Article
T1 Continuous self-imaging regime with a double-grating mask
A1 Sánchez Brea, Luis Miguel
A1 Torcal Milla, Francisco José
A1 Bernabeu Martínez, Eusebio
AB We analyze the Talbot effect produced by a mask composed of two diffraction gratings. Combinations with phase and amplitude gratings have been studied in the near-field regime. For a two-phase-gratings configuration, the Talbot effect is canceled, even when using monochromatic light; that is, the intensity distribution is nearly independent of the distance from the mask to the observation plane. Therefore, the mechanical tolerances of devices that use the Talbot effect may be improved. In addition, the spatial frequency of the fringes is quadrupled, which improves the accuracy of devices that employ this mask. An experimental verification for the best case two phase gratings, has also been performed, validating the theoretical results.
PB The Optical Society Of America
SN 1559-128X
YR 2009
FD 2009-10-20
LK https://hdl.handle.net/20.500.14352/44292
UL https://hdl.handle.net/20.500.14352/44292
LA eng
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NO © 2009 Optical Society of America.This work has been supported by project CCG08-UCM/DPI-3952 of Dirección General de Universidades e Investigación de la Consejería de Educación de la Comunidad de Madrid y Universidad Complutense de Madrid and Consorcios Estratégicos Nacionales de Investigación Tecnología project “Tecnologías avanzadas para los equipos y procesos de fabricación de 2015. e-eficiente, e-cológica, e-máquina (eEe)” of the Ministerio de Industria, Turismo y Comercio.
NO Dirección General de Universidades e Investigación de la Consejería de Educación de la Comunidad de Madrid
NO Universidad Complutense de Madrid (UCM)
NO Consorcios Estratégicos Nacionales de Investigación Tecnología, España
NO Ministerio de Economía y Competitividad (MINECO), España
NO Ministerio de Industria, Turismo y Comercio, España
DS Docta Complutense
RD 1 may 2024