TY  - JOUR
AU  - Martil De La Plaza, Ignacio
AU  - González Díaz, Germán
AU  - García, S.
AU  - Martín, J.M.
PY  - 1998
DO  - 10.1016/S0040-6090(97)00374-X
SN  - 0040-6090
UR  - https://hdl.handle.net/20.500.14352/59297
T2  - Thin Solid Films
AB  - SiNx:H films have been deposited using two different ECR plasma sources attached to a similar deposition chamber, a Compact source and an AX4500 source both from Astex. The sources mainly differ in the discharge volume, 55 cm(3) and 936 cm(3),...
LA  - eng
M2  - 22
PB  - Elsevier Science SA
KW  - Electron-Cyclotron-Resonance
KW  - Silicon-Nitride Films
KW  - Hydrogen Content
KW  - CVD.
TI  - Dependence of the physical properties of SiNx : H films deposited by the ECR plasma method on the discharge size
TY  - journal article
VL  - 315
ER  -