%0 Conference Paper
%A Pérez Zenteno, Francisco José
%A San Andrés Serrano, Enrique
%A García Hemme, Eric
%A Torres, Ignacio
%A Barrio, Rocío
%A Caudevilla Gutiérrez, Daniel
%A Duarte Cano, Sebastián
%A García Hernansanz, Rodrigo
%A Olea Ariza, Javier
%A Pastor Pastor, David
%A Prado Millán, Álvaro Del
%T High Pressure Sputtering of Mo targets in mixed Ar/O2/H2 atmospheres for hole selective contacts in photovoltaic cells
%D 2023
%@ 2643-1300
%U https://hdl.handle.net/20.500.14352/91314
%X We have deposited thin films of MoO x using high-pressure sputtering (HPS) and Ar/O 2 /H 2 atmospheres aiming at the compositional and interface control. We found that H2 impacts plasma composition, which in turn produces a reduction of the oxygen content and a change in the refractive index of the films. However, the presence of hydrogen in the plasma atmosphere enhances interfacial SiO x regrowth, as FTIR shows. TEM measurements show that this regrowth is not critical for thin films. Also, increasing the hydrogen ratio produces a change from amorphous to an amorphous/polycrystalline mixture. Lifetime measurements show that these films are adequate for their integration into test HIT -like structures, but require more work to produce competitive iVoc values.
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