TY  - JOUR
AU  - Martil De La Plaza, Ignacio
AU  - González Díaz, Germán
AU  - Prado Millán, Álvaro Del
AU  - San Andrés Serrano, Enrique
PY  - 2002
DO  - 10.1016/S0042-207X(02)00244-0
SN  - 0042-207X
UR  - https://hdl.handle.net/20.500.14352/59100
T2  - Vacuum
AB  - The bonding configuration, hydrogen evolution and defect content of rapid thermally annealed (RTA) SiOx:H films of different initial compositions were studied. Infrared absorption measurements showed that all the hydrogen present in the films was lost...
LA  - eng
M2  - 531
PB  - Pergamon-Elsevier Science Ltd.
KW  - Electron-Cyclotron-Resonance
KW  - Chemical-Vapor-Deposition
KW  - Interface
KW  - System.
TI  - Rapid thermal annealing effects on plasma deposited SiOx : H films
TY  - journal article
VL  - 67
ER  -