TY  - JOUR
AU  - Lucía Mulas, María Luisa
AU  - Pampillón Arce, María Ángela
AU  - San Andrés Serrano, Enrique
AU  - Feijoo Guerrero, Pedro Carlos
PY  - 2013
DO  - 10.1116/1.4769893
SN  - 1071-1023
UR  - https://hdl.handle.net/20.500.14352/33694
T2  - Journal of Vacuum Science & Technology B
AB  - Gadolinium oxide thin films were deposited on silicon by a two-step process: high pressure sputtering from a metallic gadolinium target followed by an in situ plasma oxidation. Several plasma conditions for metal deposition and oxidation were studied...
LA  - eng
PB  - AVS Amer Inst. Physics
KW  - Field-effect transistors
KW  - Thermal-stability
KW  - Oxide
KW  - Scandate
KW  - Dielectrics
KW  - Technology
KW  - Interfaces
TI  - Optimization of in situ plasma oxidation of metallic gadolinium thin films deposited by high pressure sputtering on silicon
TY  - journal article
VL  - 31
ER  -