RT Journal Article
T1 Deep levels in p(+)-n junctions fabricated by rapid thermal annealing of Mg or Mg/P implanted InP
A1 González Díaz, Germán
A1 Martín, J.M.
A1 Barbolla, J.
A1 Castán, E.
A1 Dueñas, S.
A1 Pinacho, R.
A1 Quintanilla, L.
AB In this work, we investigate the deep levels present in ion implanted and rapid thermal annealed (RTA) InP p(+)-n junctions. The samples were implanted with magnesium or coimplanted with magnesium and phosphorus. These levels were characterized using deep level transient spectroscopy (DLTS) and capacitance-voltage transient technique (CVTT). Seven majority deep levels located in the upper half of the band gap were detected in the junctions by using DLTS measurements, four of which (at 0.6, 0.45, 0.425, and 0.2 eV below the conduction band) result from RTA, while the origin of the other three levels (at 0.46, 0.25, and 0.27 eV below the conduction band) can be ascribed to implantation damage. An RTA-induced origin was assigned to a minority deep level at 1.33 eV above the valence band. From CVTT measurements, several characteristics of each trap were derived. Tentative assignments have been proposed for the physical nature of all deep levels.
PB American Institute of Physics
SN 0021-8979
YR 1997
FD 1997-04-01
LK https://hdl.handle.net/20.500.14352/59346
UL https://hdl.handle.net/20.500.14352/59346
LA eng
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NO © American Institute of Physics.
DS Docta Complutense
RD 4 may 2024