RT Journal Article
T1 Femtosecond pulsed laser deposition of nanostructured TiO2 films
A1 Sanz, Mikel
A1 Walczak, Malgorzata
A1 Nalda, Rebeca de
A1 Oujja, Mohamed
A1 Marco, José
A1 Rodriguez, Javier
A1 Izquierdo, Jesús
A1 Bañares Morcillo, Luis
A1 Castillejo, Marta
AB Nanostructured deposits of TiO2 were grown on Si (1 0 0) substrates by laser ablating a TiO2 sintered target in vacuum or in oxygen using a Ti:sapphire laser delivering 80 fs pulses. The effect of the laser irradiation wavelength on the obtained nanostructures, was investigated using 800, 400 and 266 nm at different substrate temperatures and pressures of oxygen. The composition of the deposits was characterized using X-ray photoelectron spectroscopy (XPS) and the surface morphology was studied by environmental scanning electron microscopy (ESEM) and atomic force microscopy (AFM). Deposits are absent of microscopic droplets in all conditions explored. The best deposits, constituted by nanoparticles of an average diameter of 30 nm with a narrow size distribution, were obtained at the shorter laser wavelength of 266 nm under vacuum at substrate room temperature
PB Elsevier
SN 0169-4332
YR 2009
FD 2009
LK https://hdl.handle.net/20.500.14352/93081
UL https://hdl.handle.net/20.500.14352/93081
LA eng
NO Sanz, Mikel, et al. «Femtosecond Pulsed Laser Deposition of Nanostructured TiO2 Films». Applied Surface Science, vol. 255, n.o 10, marzo de 2009, pp. 5206-10. https://doi.org/10.1016/j.apsusc.2008.07.148.
NO Ministerio de Economia y ́Competitividad (España)
DS Docta Complutense
RD 10 abr 2025