RT Journal Article
T1 Compositional gradients at the nanoscale in substoichiometric thin films deposited by magnetron sputtering at oblique angles: A case study on SiOx thin films
A1 Alcalá Penadés, Germán
A1 Garcia Valenzuela, Aurelio
A1 Alcaide, Antonio M.
A1 Rico, Victor
A1 Ferrer, Francisco J.
A1 Rojas, Teresa C.
A1 Alvarez, Rafael
A1 Gonzalez Elipe, Agustin R.
A1 Palmero, Alberto
AB We demonstrate the existence of stoichiometric variations at the nanoscale when growing nanocolumnar SiOx thin films by reactive magnetron sputtering deposition at oblique angles. Results show stoichiometric variations in the range 0.3 < x < 1.3 when growing a SiO0.5 thin film. This agrees with results from a numerical growth model that obtains a shift of the stoichiometry in all nanocolumns from lower values at the side facing the Si target to higher values at the opposite side. The different momentum distribution of the gaseous reactive and sputtered species results in preferential incorporation of the latter at a particular side of the nanocolumns. The general occurrence of this mechanism during the reactive magnetron sputtering deposition of substoichiometric thin films at oblique angles is discussed.
PB WILEY
YR 2021
FD 2021-09-21
LK https://hdl.handle.net/20.500.14352/126461
UL https://hdl.handle.net/20.500.14352/126461
LA eng
NO Garcia‐Valenzuela, Aurelio, et al. «Compositional Gradients at the Nanoscale in Substoichiometric Thin Films Deposited by Magnetron Sputtering at Oblique Angles: A Case Study on SiO x Thin Films». Plasma Processes and Polymers, vol. 19, n.o 1, enero de 2022, p. 2100116. DOI.org (Crossref), https://doi.org/10.1002/ppap.202100116.
NO FEDER program
NO Junta de Andalucía
NO CSIC
NO Regional Government of Madrid
NO Spanish Ministry of Science and Innovation
NO European Commission
NO University of Seville
DS Docta Complutense
RD 20 ene 2026