TY  - JOUR
AU  - Alcalá Penadés, Germán
AU  - Garcia Valenzuela, Aurelio
AU  - Alcaide, Antonio M.
AU  - Rico, Victor
AU  - Ferrer, Francisco J.
AU  - Rojas, Teresa C.
AU  - Alvarez, Rafael
AU  - Gonzalez Elipe, Agustin R.
AU  - Palmero, Alberto
PY  - 2021
DO  - 10.1002/ppap.202100116
UR  - https://hdl.handle.net/20.500.14352/126461
T2  - Plasma Processes and Polymers
AB  - We demonstrate the existence of stoichiometric variations at the nanoscale when growing nanocolumnar SiOx thin films by reactive magnetron sputtering deposition at oblique angles. Results show stoichiometric variations in the range 0.3 < x < 1.3 when...
LA  - eng
PB  - WILEY
TI  - Compositional gradients at the nanoscale in substoichiometric thin films deposited by magnetron sputtering at oblique angles: A case study on SiOx thin films
TY  - journal article
VL  - 19
ER  -