%0 Journal Article
%A Mártil de la Plaza, Ignacio
%A González Díaz, Germán
%A Hernández Rojas, J. L.
%A Lucía Mulas, María Luisa
%A Sánchez Quesada, Francisco
%A Santamaría Sánchez-Barriga, Jacobo
%T Optical spectroscopic study of the growth dynamicsof radio-frequency-sputtered YBa2Cu3O(7-x) thin films
%D 1992
%@ 0003-6951
%U https://hdl.handle.net/20.500.14352/59310
%X An optical spectroscopic study of the plasma produced during rf sputtering of an YBa2Cu3O7-x target was performed to analyze two basic properties of the deposition process: resputtering effects and oxidation mechanisms. Strong emissions of all the species above a value of the target voltage were found. These observations are associated to a strong secondary electron emission of the target which originates a negative self-bias of the substrate and a subsequent resputtering by argon cations. The addition of different amounts of oxygen to the discharge reveals that preoxidation in the gas phase may decrease the oxygen content in the films: the oxidation of the films is dominated by atomic oxygen.
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