RT Journal Article
T1 Optical spectroscopic study of the growth dynamicsof radio-frequency-sputtered YBa2Cu3O(7-x) thin films
A1 Martil De La Plaza, Ignacio
A1 González Díaz, Germán
A1 Hernández Rojas, J. L.
A1 Lucía Mulas, María Luisa
A1 Sánchez Quesada, Francisco
A1 Santamaría Sánchez-Barriga, Jacobo
AB An optical spectroscopic study of the plasma produced during rf sputtering of an YBa2Cu3O7-x target was performed to analyze two basic properties of the deposition process: resputtering effects and oxidation mechanisms. Strong emissions of all the species above a value of the target voltage were found. These observations are associated to a strong secondary electron emission of the target which originates a negative self-bias of the substrate and a subsequent resputtering by argon cations. The addition of different amounts of oxygen to the discharge reveals that preoxidation in the gas phase may decrease the oxygen content in the films: the oxidation of the films is dominated by atomic oxygen.
PB Amer Inst Physics
SN 0003-6951
YR 1992
FD 1992-07-13
LK https://hdl.handle.net/20.500.14352/59310
UL https://hdl.handle.net/20.500.14352/59310
LA eng
NO © American Institute of Physics.
DS Docta Complutense
RD 12 abr 2025