TY  - JOUR
AU  - García Hernansanz, Rodrigo
AU  - García Hemme, Eric
AU  - Montero Álvarez, Daniel
AU  - Olea Ariza, Javier
AU  - San Andrés Serrano, Enrique
AU  - Prado Millán, Álvaro Del
AU  - Ferrer, F. J.
AU  - Martil De La Plaza, Ignacio
AU  - González Díaz, Germán
PY  - 2016
DO  - 10.1088/2053-1591/3/3/036401
SN  - 2053-1591
UR  - https://hdl.handle.net/20.500.14352/24641
T2  - Materials research express
AB  - Amorphous silicon thin films were deposited using the high pressure sputtering (HPS) technique to study the influence of deposition parameters on film composition, presence of impurities, atomic bonding characteristics and optical properties. An...
LA  - eng
PB  - IOP Publishing
KW  - High pressure sputtering
KW  - Hydrogenated amorphous silicon
KW  - High deposition rate.
TI  - Limitations of high pressure sputtering for amorphous silicon deposition
TY  - journal article
VL  - 3
ER  -