TY  - CHAP
AU  - Martil De La Plaza, Ignacio
AU  - González Díaz, Germán
AU  - Prado Millán, Álvaro Del
PY  - 2009
DO  - 10.1109/SCED.2009.4800414
SN  - 978-1-4244-2838-0
UR  - https://hdl.handle.net/20.500.14352/53366
AB  - Al/HfO(2)/SiNx:H/n-Si metal-insulator-semiconductor (MIS) capacitors have been studied by electrical characterization. Films of silicon nitride were directly grown on n-type silicon substrates by electron-cyclotron-resonance assisted...
LA  - eng
M2  - 1
PB  - IEEE
KW  - Kappa Gate Dielectrics
KW  - Electrical-Properties
KW  - Transistors.
TI  - Effect of interlayer trapping and detrapping on the determination of interface state densities on high-k dielectric stacks
TY  - book part
ER  -