TY  - JOUR
AU  - Martil De La Plaza, Ignacio
AU  - González Díaz, Germán
AU  - Prado Millán, Álvaro Del
AU  - San Andrés Serrano, Enrique
PY  - 2002
DO  - 10.1016/S0042-207X(02)00243-9
SN  - 0042-207X
UR  - https://hdl.handle.net/20.500.14352/59099
T2  - Vacuum
AB  - The composition (x = [O]/[Si]), hydrogen content, bonding configuration and paramagnetic defects of SiOx films were studied. Films were deposited by the electron cyclotron resonance plasma method at room temperature using SiH4 and O-2 as precursor...
LA  - eng
M2  - 525
PB  - Pergamon-Elsevier Science Ltd.
KW  - Hydrogenated Amorphous-Silicon
KW  - Electron-Cyclotron-Resonance
KW  - Rich Oxide
KW  - Capacitors
KW  - System.
TI  - Physical properties of plasma deposited SiOx thin films
TY  - journal article
VL  - 67
ER  -