RT Journal Article
T1 Ultra-thin filaments revealed by the dielectric response across the metal-insulator transition in VO_(2)
A1 Ramírez, J. G.
A1 Schmidt, Rainer
A1 Sharoni, A.
A1 Gómez, M. E.
A1 Schuller, Ivan K.
A1 Patiño, Edgar J.
AB Temperature dependent dielectric spectroscopy measurements on vanadium dioxide thin films allow us to distinguish between the resistive, capacitive, and inductive contributions to the impedance across the metal-insulator transition (MIT). We developed a single, universal, equivalent circuit model to describe the dielectric behavior above and below the MIT. Our model takes account of phase-coexistence of metallic and insulating regions. We find evidence for the existence at low temperature of ultra-thin threads as described by a resistor-inductor element. A conventional resistorcapacitor element connected in parallel accounts for the insulating phase and the dielectric relaxation.
PB American Institute of Physics
SN 0003-6951
YR 2013
FD 2013-02-11
LK https://hdl.handle.net/20.500.14352/34809
UL https://hdl.handle.net/20.500.14352/34809
LA eng
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NO © 2013 American Institute of Physics. This work was supported by AFOSR Grant No. FA9550- 12-1-0381, COLCIENCIAS, CENM and “El Patrimonio Autónomo Fondo Nacional de Financiamiento para la Ciencia, la Tecnología y la Innovación Francisco José de Caldas” Contract RC—No. 275-2011, and ISF Grant No. 727/11. R.S. wishes to acknowledge a Ramón y Cajal Fellowship from the Ministerio de Ciencia e Innovación (MICINN) in Spain. E.J.P. wishes to acknowledge “Programa Nacional de Ciencias Básicas” COLCIENCIAS (No. 120452128168). During the publication process of this manuscript, out-of-plane impedance measurements were published on VO_(2) films grown on TiO_(2) substrates. These results also imply the coexistence of metallic and insulating phases.
NO Ministerio de Ciencia e Innovacion (MICINN)
NO AFOSR
NO COLCIENCIAS
NO CENM
NO El Patrimonio Autónomo Fondo Nacional de Financiamiento para la Ciencia, la Tecnología y la Innovación Francisco José de Caldas”
NO ISF
NO Programa Nacional de Ciencias Básicas COLCIENCIAS
DS Docta Complutense
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