2026-08-17T10:07:05Zhttps://docta.ucm.es/rest/oai/requestoai:docta.ucm.es:20.500.14352/449882023-08-27T13:22:08Zcom_20.500.14352_14col_20.500.14352_15
Monochromatic aberrations in resonant optical elements applied to a focusing multilevel reflectarray
Ginn, James
Alda, Javier
Gómez Pedrero, José Antonio
Boreman, Glenn
535
materials
metamaterials
diffraction and gratings
phase shift
imaging systems
infrared imaging
Electromagnetismo
Óptica (Física)
2202 Electromagnetismo
2209.19 Óptica Física
© 2010 Optical Society of America. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modifications of the content of this paper are prohibited.
The monochromatic aberrations produced by the phase distribution reflected by resonant sub-wavelength metallic structures are studied both analytically and numerically. Even for normal incidence, the angular dependence of the re-radiated wavefront disturbs the overall performance of the reflectarray. This effect is modelled as combination of a linear and a cubic dependence. A complete numerical simulation of a multilevel focusing reflectarray is performed using computational-electromagnetic and physical-optics-propagation methods. A modified Strehl ratio is defined to show the dependence of the focused spot behavior on aperture. The irradiance distribution is dependent on the polarization state. A small-aperture focusing reflectarray has been designed, fabricated, and tested. The irradiance distribution at the focusing plane is compared with the simulated one, showing a good agreement when residual wavefront aberrations are included.
Ministerio de Ciencia e Innovacion
Sección Deptal. de Óptica (Óptica)
Fac. de Óptica y Optometría
TRUE
pub
2023-06-20T04:09:44Z
2023-06-20T04:09:44Z
2010-05
journal article
https://hdl.handle.net/20.500.14352/44988
1094-4087
10.1364/OE.18.010931
eng
TEC2006-01882
ENE2009-14340-C02-01
open access
application/pdf
OSA