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oai:docta.ucm.es:20.500.14352/511302024-08-27T13:47:29Zcom_20.500.14352_14col_20.500.14352_15
Docta Complutense author Martil De La Plaza, Ignacio author González Díaz, Germán author Prado Millán, Álvaro Del author San Andrés Serrano, Enrique 2023-06-20T10:44:43Z 2023-06-20T10:44:43Z 2003-07-15 0021-8979 10.1063/1.1586979 https://hdl.handle.net/20.500.14352/51130 http://dx.doi.org/10.1063/1.1586979 http://scitation.aip.org The effect of rapid thermal annealing (RTA) processes on the structural properties of SiOxNyHz films was investigated. The samples were deposited by the electron cyclotron resonance plasma method, using SiH4, O-2 and N-2 as precursor gases. For SiOxNyHz films with composition close to that of SiO2, which have a very low H content, RTA induces thermal relaxation of the lattice and improvement of the structural order. For films of intermediate composition and of compositions close to SiNyHz, the main effect of RTA is the release of H at high temperatures (T>700degreesC). This H release is more significant in films containing both Si-H and N-H bonds, due to cooperative reactions between both kinds of bonds. In these films the degradation of structural order associated to H release prevails over thermal relaxation, while in those films with only N-H bonds, thermal relaxation predominates. For annealing temperatures in the 500-700degreesC range, the passivation of dangling bonds by the nonbonded H in the films and the transition from the paramagnetic state to the diamagnetic state of the K center result in a decrease of the density of paramagnetic defects. The H release observed at high annealing temperatures is accompanied by an increase of density of paramagnetic defects. eng Microstructural modifications induced by rapid thermal annealing in plasma deposited SiOxNyHz films journal article URL https://docta.ucm.es/bitstreams/c7eb6dcc-1361-4c0d-beee-afdf13e80951/download File MD5 539b34f84336049b9ca5639627f37577 334287 application/pdf Martil,51libre.pdf URL https://docta.ucm.es/bitstreams/97dd8c36-c0ee-4458-b03a-43cf3f52898f/download File MD5 9653c4e3eb66690cb14efe0bc000b2cb 55600 text/plain Martil,51libre.pdf.txt