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   <dc:title>Carrier recombination at screw dislocations in n-type AlGaN layers</dc:title>
   <dc:creator>Albrecht, M.</dc:creator>
   <dc:creator>Cremades Rodríguez, Ana Isabel</dc:creator>
   <dc:creator>Krinke, J.</dc:creator>
   <dc:creator>Christiansen, S.</dc:creator>
   <dc:creator>Ambacher, O.</dc:creator>
   <dc:creator>Piqueras De Noriega, Francisco Javier</dc:creator>
   <dc:creator>Strunk, H. P.</dc:creator>
   <dc:creator>Stutzmann, M.</dc:creator>
   <dcterms:abstract>We analyse the recombination and scattering at dislocations in Si doped AlGaN layers by transmission electron microscopy (TEM), electron beam induced current (EBIC) and cathodoluminescence. We show that c-type screw dislocations are nonradiative recombination centres. From temperature dependent measurements of the EBIC contrast we find a shallow acceptor state 20 meV above the valence band. The level can be understood iri terms of one-dimensional dislocation bands split off by the dislocation deformation field. In addition piezoelectric potentials play a role.</dcterms:abstract>
   <dcterms:dateAccepted>2023-06-20T18:52:27Z</dcterms:dateAccepted>
   <dcterms:available>2023-06-20T18:52:27Z</dcterms:available>
   <dcterms:created>2023-06-20T18:52:27Z</dcterms:created>
   <dcterms:issued>1999-11</dcterms:issued>
   <dc:type>journal article</dc:type>
   <dc:identifier>https://hdl.handle.net/20.500.14352/58826</dc:identifier>
   <dc:identifier>0370-1972</dc:identifier>
   <dc:identifier>10.1002/(SICI)1521-3951(199911)216:1&lt;409::AID-PSSB409>3.3.CO;2-B</dc:identifier>
   <dc:language>eng</dc:language>
   <dc:rights>restricted access</dc:rights>
   <dc:publisher>Wiley-V C H Verlag Gmbh</dc:publisher>
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