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oai:docta.ucm.es:20.500.14352/593102024-08-27T13:54:23Zcom_20.500.14352_14col_20.500.14352_15

Martil De La Plaza, Ignacio González Díaz, Germán Hernández Rojas, J. L. Lucía Mulas, María Luisa Sánchez Quesada, Francisco Santamaría Sánchez-Barriga, Jacobo 2023-06-20T19:08:46Z 2023-06-20T19:08:46Z 1992-07-13 0003-6951 10.1063/1.108193 https://hdl.handle.net/20.500.14352/59310 http://dx.doi.org/10.1063/1.108193 http://scitation.aip.org/ An optical spectroscopic study of the plasma produced during rf sputtering of an YBa2Cu3O7-x target was performed to analyze two basic properties of the deposition process: resputtering effects and oxidation mechanisms. Strong emissions of all the species above a value of the target voltage were found. These observations are associated to a strong secondary electron emission of the target which originates a negative self-bias of the substrate and a subsequent resputtering by argon cations. The addition of different amounts of oxygen to the discharge reveals that preoxidation in the gas phase may decrease the oxygen content in the films: the oxidation of the films is dominated by atomic oxygen. eng open access Optical spectroscopic study of the growth dynamics of radio-frequency-sputtered YBa2Cu3O(7-x) thin films journal article