2026-06-26T07:28:47Zhttps://docta.ucm.es/rest/oai/request

oai:docta.ucm.es:20.500.14352/85012025-03-17T16:42:28Zcom_20.500.14352_14col_20.500.14352_15

San Andrés Serrano, Enrique García Hernansanz, Rodrigo Patricia Moreno, Gloria García Hemme, Eric Barrio, Rocío Torres Almarza, Ignacio Caudevilla Gutiérrez, Daniel Pastor Pastor, David Olea Ariza, Javier Prado Millán, Álvaro Del Algaidy, Sari Zenteno Pérez, Francisco 2023-06-17T09:15:56Z 2023-06-17T09:15:56Z 2021 10.1109/CDE52135.2021.9455754 https://hdl.handle.net/20.500.14352/8501 https://doi.org/10.1109/CDE52135.2021.9455754 In this work we have explored the growth by high pressure sputtering (HPS) of materials intended for novel selective contacts for photovoltaic cells. This technique shows promise for the low-damage low-temperature deposition of PV materials. We studied the deposition of ITO, MoOx and TiOx using pure Ar and mixed Ar/O2 atmospheres as well as ceramic or metallic targets. We show that HPS deposition of these materials is feasible. The growth rate is greatly reduced when oxygen is added to the argon sputtering atmosphere. The best sputtering RF power was 20-45 W for the pressure range studied. Finally, as-deposited films present high surface recombination, but a mild hot plate anneal at 200ºC recovers long effective lifetimes. eng https://creativecommons.org/licenses/by-nc-sa/3.0/es/ open access Atribución-NoComercial-CompartirIgual 3.0 España High Pressure Sputtering of materials for selective contacts in emerging photovoltaic cells journal article