Rico García, José MaríaLópez Alonso, José ManuelAlda Serrano, Javier2023-06-202023-06-20© 2005 Opt2005-05-16Optica Publishing Group. https://opg.optica.org/oe/viewmedia.cfm?uri=oe-13-10-3802&html=true. Accedido 8 de julio de 2024.1094-408710.1364/OPEX.13.003802https://hdl.handle.net/20.500.14352/51705Es una versión postprint. La versión publicada está en Open Access en la web del editor.The manufacture of a photonic crystal always produce deviations from the ideal case. In this paper we present a detailed analysis of the influence of the manufacture errors in the resulting electric field distribution of a photonic crystal microcavity. The electromagnetic field has been obtained from a FDTD algorithm. The results are studied by using the Principal Component Analysis method. This approach quantifies the influence of the error in the preservation of the spatial-temporal structure of electromagnetic modes of the ideal microcavity. The results show that the spatial structure of the excited mode is well preserved within the range of imperfection analyzed in the paper. The deviation from the ideal case has been described and quantitatively estimated.engCharacterization of photonic crystal microcavities with manufacture imperfectionsjournal articlehttp://dx.doi.org/10.1364/OPEX.13.003802https://www.osapublishing.org/oe/fulltext.cfm?uri=oe-13-10-3802&id=83827http://cisne.sim.ucm.es/record=b3528557~S6*spiopen access535537.8548.0:53Micro-OpticsMicrostructured devicesProbability theoryStochstic processesFísica (Física)ElectromagnetismoÓptica (Física)Cristalografía (Química)Óptica física, óptica cuántica22 Física2202 Electromagnetismo2209.19 Óptica Física2211.04 Cristalografía2209.19 Óptica física