Martil De La Plaza, IgnacioGonzález Díaz, GermánHernández Rojas, J. L.Lucía Mulas, María LuisaSánchez Quesada, FranciscoSantamaría Sánchez-Barriga, Jacobo2023-06-202023-06-201992-07-130003-695110.1063/1.108193https://hdl.handle.net/20.500.14352/59310© American Institute of Physics.An optical spectroscopic study of the plasma produced during rf sputtering of an YBa2Cu3O7-x target was performed to analyze two basic properties of the deposition process: resputtering effects and oxidation mechanisms. Strong emissions of all the species above a value of the target voltage were found. These observations are associated to a strong secondary electron emission of the target which originates a negative self-bias of the substrate and a subsequent resputtering by argon cations. The addition of different amounts of oxygen to the discharge reveals that preoxidation in the gas phase may decrease the oxygen content in the films: the oxidation of the films is dominated by atomic oxygen.engjournal articlehttp://dx.doi.org/10.1063/1.108193http://scitation.aip.org/open access537PhysicsApplied.ElectricidadElectrónica (Física)2202.03 Electricidad