Person:
Bernabéu Martínez, Eusebio

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First Name
Eusebio
Last Name
Bernabéu Martínez
URI
https://hdl.handle.net/20.500.14352/82757
Affiliation
Universidad Complutense de Madrid
Faculty / Institute
Ciencias Físicas
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Area
Optica
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Author: Alonso Fernández, José × Has files: false ×

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    Laser beam deflectometry based on a subpixel resolution algorithm
    (Optical Engineering, 2001) Canabal Boutureira, Héctor Alfonso; Alonso Fernández, José; Bernabéu Martínez, Eusebio
    A deflectometric method for the characterization of optical systems is presented. It is based on the use of a CCD camera and a subpixel resolution algorithm for the measurement of the deflection of a laser beam that propagates through the system. To obtain accurate results, three different algorithms for measuring the position of the deflected beam are tested and compared. Based on this comparison, an algorithm based on the calculation of the phase of the fast Fourier transform (FFT) is selected, and an accuracy of 0.024 pixels is obtained on the determination of the beam position in our setup. Using an XY scanning stage, the proposed method is completely automated and applied for the characterization of ophthalmic lenses. In this application, the gradients of the wavefront refracted by the lens are measured directly, and from them, the thickness and the local power of the lens are computed.
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    Optical autofocus for high resolution laser photoplotting
    (Photonic Materials, Devices, and Applications, 2005) Alonso Fernández, José; Crespo Vázquez, Daniel; Jiménez Castillo, Isidoro; Bernabéu Martínez, Eusebio; Badenes, Goncal; Abbott, Derek; Serpenguzel, Ali
    An all optical autofocus has been designed and tested for tight line width control in a high NA laser photoplotter system. The laser system is based in a GaN semiconductor laser with power 30 mW and wavelength 405 nm. The advantage of using this laser, despite the relatively long wavenlength, is compactness and easy for high frequency modulation. The autofocus system is based in a secondary 635 nm GaAlAs laser without need for wavelength, neither power stabilization. The two beams are delivered coaxially through the focusing lens by means of a dichroic beamsplitter. Focusing lens need no correction for chromatic aberration, as this is compensed by appropriate autofocus beam divergence. After reflection in the sample, the autofocus beam is separated from the returning writing beam and then guided to a collimation sensor, in which defocus of about 1/20 of the Rayleigh range of the writing beam can be detected and compensated by an analogue PID electronic control. Stable linewidth within 5% is achieved with different numerical aperture focusing lenses.