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Study of thermal treated a-Si implanted with Er and O ions

dc.contributor.authorPlugaru, R.
dc.contributor.authorMéndez Martín, María Bianchi
dc.contributor.authorPiqueras De Noriega, Francisco Javier
dc.contributor.authorTate, T.J.
dc.date.accessioned2023-06-20T18:55:02Z
dc.date.available2023-06-20T18:55:02Z
dc.date.issued2002-12-16
dc.description© 2002 IOP Publishing Ltd. This work has been supported byMCYT (ProjectMAT2000-2119). RP acknowledgesMECD for the research grant SB2000-0164. Conference on Extended Defects in Semiconductors (EDS 2002)(2002. Bologna, Italia)
dc.description.abstractVisible luminescence of amorphous silicon layers either implanted with Er or co-implanted with Er and O and subsequently annealed in nitrogen has been investigated by cathodoluminescence (CL) in a scanning electron microscope. Co-implanted samples show a more intense luminescence, which is revealed by annealing at lower temperatures than the samples implanted only with erbium. Thermal treatments cause the formation of erbium oxide as well as Er-Si complexes or precipitates. Violet-blue luminescence has been found from CL images and spectra to be related to Er-Si precipitates. Emission in the green-red range is attributed to oxide species.
dc.description.departmentDepto. de Física de Materiales
dc.description.facultyFac. de Ciencias Físicas
dc.description.refereedTRUE
dc.description.sponsorshipMCYT
dc.description.sponsorshipMECD
dc.description.statuspub
dc.eprint.idhttps://eprints.ucm.es/id/eprint/24419
dc.identifier.doi10.1088/0953-8984/14/48/363
dc.identifier.issn0953-8984
dc.identifier.officialurlhttp://iopscience.iop.org/0953-8984/14/48/363
dc.identifier.relatedurlhttp://iopscience.iop.org
dc.identifier.urihttps://hdl.handle.net/20.500.14352/58919
dc.issue.number48
dc.journal.titleJournal of Physics: Condensed Mater
dc.language.isoeng
dc.page.final13159
dc.page.initial13153
dc.publisherInstitute of Physics
dc.relation.projectIDMAT 2000-2119
dc.relation.projectIDSB2000-0164
dc.rights.accessRightsopen access
dc.subject.cdu538.9
dc.subject.keywordErbium Luminescence
dc.subject.keywordAmorphous-Silicon
dc.subject.keywordCrystal Silicon
dc.subject.keywordPorous Silicon
dc.subject.keywordExcitation
dc.subject.keywordCathodoluminescence
dc.subject.keywordPhotoluminescence
dc.subject.keywordFilms
dc.subject.keywordSegregation
dc.subject.keywordEpitaxy
dc.subject.ucmFísica de materiales
dc.titleStudy of thermal treated a-Si implanted with Er and O ions
dc.typejournal article
dc.volume.number14
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dspace.entity.typePublication
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relation.isAuthorOfPublication.latestForDiscovery465cfd5b-6dd4-4a48-a6e3-160df06f7046

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