Bandpass filter implemented with blazed waveguide sidewall gratings in silicon-on-insulator
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2012
Authors
Villafranca Velasco, Aitor
Bock, Przemek J.
Cheben, Pavel
Schmid, Jens H.
Lapointe, Jean
Xu, Dan-Xia
Janz, Siegfried
Delâge, André
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The Institution of Engineering and Technology (IET)
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2 Madsen, C.K.: ‘Efficient architectures for exactly realizing optical filters with optimum bandpass designs’, IEEE Photonics Technol. Lett., 1998, 10, (8), pp. 1136–1138.
3 Cheben, P.: ‘Wavelength dispersive planar waveguide devices’ in ‘Optical waveguides: from theory to applied technologies’ (CRC Press, 2007), pp. 173–230.
4 Mizuno, T., Oguma, M., Kitoh, T., Inoue, Y., and Takahashi, H.: ‘Lattice-form CWDM interleave filter using silica-based planar lightwave circuit’, IEEE Photonics Technol. Lett., 2006, 18, (15), pp. 1570–1572.
5 Hao, Y., Wu, Y., Yang, J., Jiang, X., and Wang, M.: ‘Novel dispersive and focusing device configuration based on curved waveguide grating’, Opt. Express, 2006, 14, (19), pp. 8630–8637.
6 Bock, P.J., Cheben, P., Delâge, A., Schmid, J.H., Xu, D.-X., Janz, S., and Hall, T.J.: ‘Demultiplexer with blazed waveguide sidewall grating and sub-wavelength grating structure’, Opt. Express, 2008, 16, (22), pp. 17616–17625.
7 Schmid, J.H., Cheben, P., Janz, S., Lapointe, J., Post, E., and Xu, D.-X.: ‘Gradient-index antireflective subwavelength structures for planar waveguide facets’, Opt. Lett., 2007, 32, (13), pp. 1794–1796.
Abstract
The fabrication and experimental characterisation of a two-stage bandpass filter based on curved waveguide sidewall gratings is reported for the silicon-on-insulator platform. At each cascaded filtering stage, the spectral components of the input signal are dispersed by the diffraction grating formed in the sidewall of a silicon strip waveguide. Different wavelengths are focused onto different positions along the Rowland circle and the filter central wavelength is selected by a specific receiver waveguide. By using two consecutive filtering stages, both the filter passband profile and the stopband rejection ratio are substantially increased. The grating is apodised and chirped to ensure a constant effective index along the grating length to minimise phase distortions. Blazed geometry is used to maximise the diffraction efficiency to the - 1st order. The device was fabricated with electron beam lithography and reactive ion etching using a single etch step. A bandwidth of 6.2 nm was measured near 1590 nm for the fabricated filter, with a roll-off of 4 dB/nm at the passband edge, and a stopband rejection of 40 dB.
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© The Institution of Engineering and Technology 2012.
Financial support from the Spanish Ministry of Science and Innovation is acknowledged under grant TEC2008-04105.