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Effect of ion beam milling on the defect structure of CdTe

dc.contributor.authorPanin, G. N.
dc.contributor.authorFernández Sánchez, Paloma
dc.contributor.authorPiqueras De Noriega, Francisco Javier
dc.date.accessioned2023-06-20T19:04:28Z
dc.date.available2023-06-20T19:04:28Z
dc.date.issued1996-09
dc.description© 1996 IOP Publishing Ltd. This work has been supported by DGICYT (project PB93-1256). G Panin thanks the Ministerio de Educacion y Ciencia for a research grant. Japan Energy Corporation is acknowledged for providing some of the samples.
dc.description.abstractThe effect of ion milling on the defect structure of CdTe crystals has been investigated in the scanning electron microscope by cathodoluminescence. Enhancement in the luminescence intensity is observed after ion treatment. Luminescence spectra of treated and untreated zones of the samples indicate that ion milling causes generation of tellurium vacancies and filling of cadmium vacancies in a subsurface layer. In addition, enhancement of the concentration of cadmium vacancy related defects in the region extending up to 20 mu m from the layer is revealed. This effect is discussed in connection with models of p- to n-type conversion of CdTe during ion milling.
dc.description.departmentDepto. de Física de Materiales
dc.description.facultyFac. de Ciencias Físicas
dc.description.refereedTRUE
dc.description.sponsorshipDGICYT
dc.description.sponsorshipMinisterio de Educacion y Ciencia
dc.description.statuspub
dc.eprint.idhttps://eprints.ucm.es/id/eprint/26735
dc.identifier.doi10.1088/0268-1242/11/9/018
dc.identifier.issn0268-1242
dc.identifier.officialurlhttp://dx.doi.org/10.1088/0268-1242/11/9/018
dc.identifier.relatedurlhttp://iopscience.iop.org
dc.identifier.urihttps://hdl.handle.net/20.500.14352/59208
dc.issue.number9
dc.journal.titleSemiconductor Science and Technology
dc.language.isoeng
dc.page.final1357
dc.page.initial1354
dc.publisherIOP Publishing Ltd
dc.relation.projectIDPB93-1256
dc.rights.accessRightsrestricted access
dc.subject.cdu538.9
dc.subject.keywordDeep Centers
dc.subject.keywordCathodoluminescence
dc.subject.keywordConversion Hg_(1-X)Cd_xTe
dc.subject.ucmFísica de materiales
dc.titleEffect of ion beam milling on the defect structure of CdTe
dc.typejournal article
dc.volume.number11
dcterms.references[1] Blackman M V, Charlton D E, Jenner M D, Purdy D R, Wotherspoon J T M, Elliot C T and White A M 1987 Electron Lett. 23 978 [2] Bahir G and Finkman E 1989 J. Vac. Sci. Technol. A 7 348 [3] Panin G N and Yakimov E B 1989 Sov. Phys.–Semicond. 23 840 [4] Barbot J F, Kronewitz J and Schroter W 1990 ¨ Appl. Phys. Lett. 57 2689 [5] Chien Kuo-Fu, Fahrenbruch A L and Bube R H 1988 J. Appl. Phys. 64 2792 [6] Blanchard C, Favre J, Barbot J F, Desoyer J C, Toulemonde M, Konczykowski M, Le Scoul D and Dessus J L 1990 J. Appl. Phys. 68 3237 [7] Hofmann D M, Städler W, Oettinger K, Meyer B K, Omling P, Salk M, Benz K W, Weigel E and Müller-Vogt G 1993 Mater. Sci. Eng. B 16 128 [8] Pal U, Piqueras J, Fernández P, Serrano M D and Diéguez E 1994 J. Appl. Phys. 76 3720 [9] Domínguez-Adame F, Piqueras J and Fernández P 1991 Appl. Phys. Lett. 58 257 [10] Casey H C and Jayson J S 1971 J. Appl. Phys. 42 2774 [11] Pal U, Fernández P, Piqueras J, Serrano M D and Diéguez E 1994 Defect Recognition and Image Processing in Semiconductors and Devices (Inst. Phys. Conf. Ser. 135) 177 [12] Pal U, Fernández P and Piqueras J 1995 Mater. Lett. 23 227 [13] Takebe T, Saraie J and Matsunami H 1982 J. Appl. Phys. 53 457 [14] Pal U, Fernández P, Piqueras J, Sochinskii N V and Diéguez E 1995 J. Appl. Phys. 78 1992
dspace.entity.typePublication
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relation.isAuthorOfPublication.latestForDiscoverydaf4b879-c4a8-4121-aaff-e6ba47195545

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