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Application of cathodoluminescence microscopy to the study of native acceptors in gallium antimonide

dc.book.titleCAS '96 Proceedings - 1996 International Semiconductor Conference
dc.contributor.authorPiqueras De Noriega, Francisco Javier
dc.contributor.authorMéndez Martín, María Bianchi
dc.contributor.authorPanin, G. N.
dc.contributor.authorDutta, P. S.
dc.contributor.authorDieguez, E.
dc.date.accessioned2023-06-20T21:08:58Z
dc.date.available2023-06-20T21:08:58Z
dc.date.issued1996
dc.description© 1996 IEEE. 1996 International Semiconductor Conference (CAS 96) (1996.Sinaia, Romania)
dc.description.abstractCathodoluminescence in the scanning electron microscope is used to ivestigate growth and prosess induced defects in GaSb crystals. In particular, luminescence emission has been used to study the nature of acceptor defects present after different annealing and irradiation treatments.
dc.description.departmentDepto. de Física de Materiales
dc.description.facultyFac. de Ciencias Físicas
dc.description.refereedTRUE
dc.description.statuspub
dc.eprint.idhttps://eprints.ucm.es/id/eprint/24835
dc.identifier.isbn0-7803-3223-7
dc.identifier.officialurlhttp://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=557426
dc.identifier.relatedurlhttp://ieeexplore.ieee.org
dc.identifier.urihttps://hdl.handle.net/20.500.14352/60822
dc.language.isoeng
dc.page.final506
dc.page.initial497
dc.page.total10
dc.publisherI E E E
dc.rights.accessRightsopen access
dc.subject.cdu538.9
dc.subject.keywordEngineering
dc.subject.keywordElectrical & Electronic
dc.subject.ucmFísica de materiales
dc.titleApplication of cathodoluminescence microscopy to the study of native acceptors in gallium antimonide
dc.typebook part
dc.volume.number1 y 2
dcterms.references1) A.G. Milnes and A.Y. Polyakov, Solid State Electronics 34, 803 (1993) 2) B. Méndez, P.S. Dutta, J. Piqueras and E. Dieguez, Appl. Phys. Lett. 67,2648 (1995) 3) G.N. Panin, P.S. Dutta, 9. Piqueras and E. Dieguez, Appl. Phys. Lett. 67,3584 (1995) 4) P.S. Dutta, A.K. Sreedhar? I3.L. Bhat, G.C. Duber, V. Kumar, E. Dieguez, U. Pal and 3. Piqueras, Accepted in Journal of Applied Physics 5 ) K. Nakashima, Jpn. J. Appl. Phys. 24,1085 (1981) 6) A. I. Lebedev and LA. Stsel'nikova, Sov. Phys. Semicond. 13,229 (1979) 7) R.Callec, P.N. Favennec, M.Salvi, H.L. Haridon, and M.Gauneau, Appl.Phys.Lett.S,1872 (1 99 1) 8) S.9. Pearton, A.R. Von Neida, 9. M. Brown, K.T. Short, L. J. Oster, and U.K. Chakrabarti, J. Appl. Phys. @, 629 (1988) 9) M. Perotin, L. Gouskov, M.L uquet, P. Abiale Abi, A. Sabir, and A. Perez, J. Appl. Phys. a,37 56 (1990) 10) Y. K. Su, K.J. Gan, J.S. Hwang, and S.L. Tyan, J. Appl. Phys. 48,5584 (1990) 1 1 ) P.S. Dutta, K.S. Sangunni, H.L. Bhat and V. Kumar, J. Cryst. Growth. W,44 (1994) 12) B. MBndez and J. Piqueras, 3. Appl. Phys. 69,2776 (1991) 13) W. Jakowetz, W. Ruhle, K.Breuninger, and M. Pilkuhn, Phys. Stat. Sol.(a) 12, 169 (1972) 14) M. Lee, D.J. Nicholas, K.E.Singer, and B. Hamilton, J. Appl. Phys. 3,2895 (3986) 15) M.C. Wu, and G.C.C hen, J.Appl. Phys. 72,4275 (1992) 16) D.. Weiler and H. Mehrer, Philos. Mag. A 422,309 (1984) 17) J. Doerschel and U. Geissler, J. Crystal Growth. 121,781 (1992)
dspace.entity.typePublication
relation.isAuthorOfPublication68dabfe9-5aec-4207-bf8a-0851f2e37e2c
relation.isAuthorOfPublication465cfd5b-6dd4-4a48-a6e3-160df06f7046
relation.isAuthorOfPublication.latestForDiscovery465cfd5b-6dd4-4a48-a6e3-160df06f7046

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