Silicon‐based intermediate‐band infrared photodetector realized by Te Hyperdoping

dc.contributor.authorWang, Mao
dc.contributor.authorGarcía Hemme, Eric
dc.contributor.authorBerencén, Yonder
dc.contributor.authorHübner, René
dc.contributor.authorXie, Yufang
dc.contributor.authorRebohle, Lars
dc.contributor.authorXu, Chi
dc.contributor.authorSchneider, Harald
dc.contributor.authorHelm, Manfred
dc.contributor.authorZhou, Shengqiang
dc.date.accessioned2024-02-09T16:49:32Z
dc.date.available2024-02-09T16:49:32Z
dc.date.issued2020
dc.descriptionFree full text from Published (Versión Publicada Open Acces en https://onlinelibrary.wiley.com/doi/10.1002/adom.202001546)
dc.description.abstractSi-based photodetectors satisfy the criteria of being low-cost and environmentally friendly, and can enable the development of on-chip complementary metal-oxide-semiconductor (CMOS)-compatible photonic systems. However, extending their room-temperature photoresponse into the mid-wavelength infrared (MWIR) regime remains challenging due to the intrinsic bandgap of Si. Here, we report on a comprehensive study of a room-temperature MWIR photodetector based on Si hyperdoped with Te. The demonstrated MWIR p-n photodiode exhibits a spectral photoresponse up to 5 mu m and a slightly lower detector performance than the commercial devices in the wavelength range of 1.0-1.9 mu m. The correlation between the background noise and the sensitivity of the Te-hyperdoped Si photodiode, where the maximum room-temperature specific detectivity is found to be 3.2 x 10(12) cmHz(1/2) W-1 and 9.2 x 10(8) cmHz(1/2) W-1 at 1 mu m and 1.55 mu m, respectively, is also investigated. This work contributes to pave the way towards establishing a Si-based broadband infrared photonic system operating at room temperature.en
dc.description.departmentDepto. de Estructura de la Materia, Física Térmica y Electrónica
dc.description.facultyFac. de Ciencias Físicas
dc.description.refereedTRUE
dc.description.sponsorshipComunidad de Madrid
dc.description.sponsorshipMinisterio de Economía y Competitividad (España)
dc.description.sponsorshipDeutsche Forschungsgemeinschaft
dc.description.sponsorshipChina Scholarship Council
dc.description.sponsorshipEuropean Commission
dc.description.statuspub
dc.identifier.citationWang, Mao, et al. «Silicon‐Based Intermediate‐Band Infrared Photodetector Realized by Te Hyperdoping». Advanced Optical Materials, vol. 9, n.o 4, febrero de 2021, p. 2001546. https://doi.org/10.1002/adom.202001546.
dc.identifier.doi10.1002/adom.202001546
dc.identifier.issn2195-1071
dc.identifier.officialurlhttps://doi.org/10.1002/adom.202001546
dc.identifier.urihttps://hdl.handle.net/20.500.14352/101023
dc.issue.number4
dc.journal.titleAdvanced Optical Materials
dc.language.isoeng
dc.publisherWiley
dc.relation.projectIDinfo:eu-repo/grantAgreement/03SF0451
dc.relation.projectIDinfo:eu-repo/grantAgreement/201506240060
dc.relation.projectIDinfo:eu-repo/grantAgreement/WA4804/1-1
dc.relation.projectIDinfo:eu-repo/grantAgreement/S2018/EMT-4308
dc.relation.projectIDinfo:eu-repo/grantAgreement/TEC2017-84378-R
dc.rightsAttribution 4.0 International
dc.rights.accessRightsopen access
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.subject.cdu537
dc.subject.keywordCMOS compatible
dc.subject.keywordHyperdoping
dc.subject.keywordIon implantation
dc.subject.keywordMid-wavelength infrared photodetectors
dc.subject.keywordSi photonics
dc.subject.ucmElectrónica (Física)
dc.subject.unesco2203.08 Fotoelectricidad
dc.titleSilicon‐based intermediate‐band infrared photodetector realized by Te Hyperdoping
dc.typejournal article
dc.type.hasVersionAM
dc.volume.number9
dspace.entity.typePublication
relation.isAuthorOfPublication765f38c4-71cb-441b-b2a8-d88c5cdcf086
relation.isAuthorOfPublication.latestForDiscovery765f38c4-71cb-441b-b2a8-d88c5cdcf086

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