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A robust method to determine the contact resistance using the van der Pauw set up

dc.contributor.authorGonzález Díaz, Germán
dc.contributor.authorPastor, D.
dc.contributor.authorGarcía Hemme, Eric
dc.contributor.authorMontero, Daniel
dc.contributor.authorGarcía Hernansanz, Rodrigo
dc.contributor.authorOlea Ariza, Javier
dc.contributor.authorPrado Millán, Álvaro Del
dc.contributor.authorSan Andrés Serrano, Enrique
dc.contributor.authorMartil De La Plaza, Ignacio
dc.date.accessioned2023-06-17T21:55:09Z
dc.date.available2023-06-17T21:55:09Z
dc.date.issued2017-02
dc.description© 2017 Elsevier B.V. Authors would like to acknowledge the CAI de Técnicas Físicas of the Universidad Complutense de Madrid for the metallic evaporations and sample etching. This work was partially supported by the Project MADRID-PV (Grant No. P2013/MAE-2780) funded by the Comunidad de Madrid and by the Spanish MINECO (Economic and Competitiviness Ministery) under grant TEC 2013- 41730-R Research by E. García-Hemme was also supported by a PICATA predoctoral fellowship of the Moncloa Campus of International Excellence (UCM-UPM). D. Pastor acknowledges the financial support to the grant EX-2010-0662 from the Spanish Science Ministry.
dc.description.abstractThe van der Pauw method to calculate the sheet resistance and the mobility of a semiconductor is a pervasive technique both in the microelectronics industry and in the condensed matter science field. There are hundreds of papers dealing with the influence of the contact size, nonuniformities and other second order effects. In this paper we will develop a simple methodology to evaluate the error produced by finite size contacts, detect the presence of contact resistance, calculate it for each contact, and determine the linear or rectifying behavior of the contact. We will also calculate the errors produced by the use of voltmeters with finite input resistance in relation with the sample sheet resistance.
dc.description.departmentDepto. de Estructura de la Materia, Física Térmica y Electrónica
dc.description.facultyFac. de Ciencias Físicas
dc.description.refereedTRUE
dc.description.sponsorshipMinisterio de Economía y Competitividad (MINECO)
dc.description.sponsorshipComunidad de Madrid
dc.description.sponsorshipCampus de Excelencia Internacional (UCM-UPM)
dc.description.statuspub
dc.eprint.idhttps://eprints.ucm.es/id/eprint/42549
dc.identifier.doi10.1016/j.measurement.2016.11.040
dc.identifier.issn0263-2241
dc.identifier.officialurlhttp://dx.doi.org/10.1016/j.measurement.2016.11.040
dc.identifier.relatedurlhttp://www.sciencedirect.com
dc.identifier.urihttps://hdl.handle.net/20.500.14352/17787
dc.journal.titleMeasurement
dc.language.isoeng
dc.page.final158
dc.page.initial151
dc.publisherElsevier Sci. Ltd
dc.relation.projectIDTEC 2013- 41730-R
dc.relation.projectIDMADRID-PV (P2013/MAE-2780)
dc.relation.projectIDPICATA
dc.relation.projectIDEX-2010-0662
dc.rightsAtribución 3.0 España
dc.rights.accessRightsopen access
dc.rights.urihttps://creativecommons.org/licenses/by/3.0/es/
dc.subject.cdu537
dc.subject.keywordResistivity
dc.subject.ucmElectricidad
dc.subject.ucmElectrónica (Física)
dc.subject.unesco2202.03 Electricidad
dc.titleA robust method to determine the contact resistance using the van der Pauw set up
dc.typejournal article
dc.volume.number98
dspace.entity.typePublication
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