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Characterization of photonic crystal microcavities with manufacture imperfections

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dc.contributor.authorRico García, José María
dc.contributor.authorLópez Alonso, José Manuel
dc.contributor.authorAlda Serrano, Javier
dc.date.accessioned2023-06-20T11:05:48Z
dc.date.available2023-06-20T11:05:48Z
dc.date.copyright© 2005 Optical Society of America. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modifications of the content of this paper are prohibited.
dc.date.issued2005-05-16
dc.descriptionEs una versión postprint. La versión publicada está en Open Access en la web del editor.
dc.description.abstractThe manufacture of a photonic crystal always produce deviations from the ideal case. In this paper we present a detailed analysis of the influence of the manufacture errors in the resulting electric field distribution of a photonic crystal microcavity. The electromagnetic field has been obtained from a FDTD algorithm. The results are studied by using the Principal Component Analysis method. This approach quantifies the influence of the error in the preservation of the spatial-temporal structure of electromagnetic modes of the ideal microcavity. The results show that the spatial structure of the excited mode is well preserved within the range of imperfection analyzed in the paper. The deviation from the ideal case has been described and quantitatively estimated.en
dc.description.departmentSección Deptal. de Óptica (Óptica)
dc.description.facultyFac. de Óptica y Optometría
dc.description.refereedTRUE
dc.description.sponsorshipMinisterio de Ciencia yTecnología de España
dc.description.sponsorshipComunidad de Madrid
dc.description.statuspub
dc.eprint.idhttps://eprints.ucm.es/id/eprint/35191
dc.identifier.citationOptica Publishing Group. https://opg.optica.org/oe/viewmedia.cfm?uri=oe-13-10-3802&html=true. Accedido 8 de julio de 2024.
dc.identifier.doi10.1364/OPEX.13.003802
dc.identifier.issn1094-4087
dc.identifier.officialurlhttp://dx.doi.org/10.1364/OPEX.13.003802
dc.identifier.relatedurlhttps://www.osapublishing.org/oe/fulltext.cfm?uri=oe-13-10-3802&id=83827
dc.identifier.relatedurlhttp://cisne.sim.ucm.es/record=b3528557~S6*spi
dc.identifier.urihttps://hdl.handle.net/20.500.14352/51705
dc.issue.number10
dc.journal.titleOptics Express
dc.language.isoeng
dc.page.final3815
dc.page.initial3802
dc.publisherOSA (Optical Society of America) Publishing
dc.relation.projectIDTIC2001-1259
dc.relation.projectIDGR/MAT/0497/2004
dc.rights.accessRightsopen access
dc.subject.cdu535
dc.subject.cdu537.8
dc.subject.cdu548.0:53
dc.subject.keywordMicro-Optics
dc.subject.keywordMicrostructured devices
dc.subject.keywordProbability theory
dc.subject.keywordStochstic processes
dc.subject.ucmFísica (Física)
dc.subject.ucmElectromagnetismo
dc.subject.ucmÓptica (Física)
dc.subject.ucmCristalografía (Química)
dc.subject.ucmÓptica física, óptica cuántica
dc.subject.unesco22 Física
dc.subject.unesco2202 Electromagnetismo
dc.subject.unesco2209.19 Óptica Física
dc.subject.unesco2211.04 Cristalografía
dc.subject.unesco2209.19 Óptica física
dc.titleCharacterization of photonic crystal microcavities with manufacture imperfectionsen
dc.typejournal article
dc.volume.number13
dspace.entity.typePublication
relation.isAuthorOfPublicationf83d6ebf-28e1-4568-ac27-e4db5acfc6dd
relation.isAuthorOfPublicatione52aef01-c246-4f9f-9cfd-d9dfb2a8ee79
relation.isAuthorOfPublicationa5f0b8a9-10aa-4bf8-9527-e94b095468b8
relation.isAuthorOfPublication.latestForDiscoverya5f0b8a9-10aa-4bf8-9527-e94b095468b8

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